Código arancelario 3923109010
Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Jerarquía de clasificación arancelaria
39PLASTICS AND ARTICLES THEREOF3923Articles for the conveyance or packing of goods, of plastics; stoppers, lids, caps and other closures, of plastics392310Boxes, cases, crates and similar articles39231090Other3923109010Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
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